GATE 2013 (EC) - Electronic Devices
ONE MARK Questions
- In IC Technology, Dry oxidation ( using Dry oxidation ) as compared to Wet oxidation ( using stream or water vapor ) produces ……………..
- superior quality oxide with a higher growth rate
- inferior quality oxide with a higher growth rate
- inferior quality oxide with a lower growth rate
- superior quality oxide with a lower growth rate
- In a Forward Biased PN junction diode, the sequence of events that best describes the mechanism of current flow is
- Injection and subsequent diffusion and recombination of minority carriers
- Injection and subsequent drift and generation of minority carriers
- Extraction and subsequent diffusion and generation of minority carriers
- Extraction and subsequent drift and recombination of minority carriers
- In a MOSFET operating in saturation region, the channel length modulation effect causes,
- an increase in gate source capacitance
- a decrease in transconductance
- a decrease in unity gain bandwidth product
- a decrease in output resistance

thanks for these videos. It is really useful. i hv a doubt in the first question.there u hv mentioned both wet & dry oxidation are used to form thin oxides. but u refer dry oxidation formation as gate oxide and for wet oxidation as field oxide. whether both are same or not?
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actually dry oxidation is a slow process w.r.t wet one but it give superior electrical quality ....
ReplyDeleteactually dry oxidation is a slow process w.r.t wet one but it give superior electrical quality ....
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